GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials

Standard Number: GB/T 20176-2006
Chinese:表面化学分析 二次离子质谱 用均匀掺杂物质测定硅中硼的原子浓度
English:Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials

Effective Date:2006-11-01
Regulatory Authority:National Standardization Administration of China
Issuing Regulatory Authority:General Administration of Quality Supervision, Inspection and Quarantine of the People’s Republic of China,National Standardization Administration of China

Adheres to international standards:Y
PDF Downloadable:N

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