GB/T 32495-2016 Surface chemical analysis-Secondary-ion mass spectrometry-Method for depth profiling of arsenic in silicon

Standard Number: GB/T 32495-2016
Chinese:表面化学分析 二次离子质谱 硅中砷的深度剖析方法
English:Surface chemical analysis-Secondary-ion mass spectrometry-Method for depth profiling of arsenic in silicon

Effective Date:2017-01-01
Regulatory Authority:National Standardization Administration of China
Issuing Regulatory Authority:General Administration of Quality Supervision, Inspection and Quarantine of the People’s Republic of China,National Standardization Administration of China

Adheres to international standards:Y
PDF Downloadable:N

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