Standard Number: YS/T 1025-2015(YS/T1025-2015)
Chinese:电子薄膜用高纯钨及钨合金溅射靶材
English:High purity tungsten and tungsten alloy sputtering targets for electronic films
Effective Date:2015-10-01
Standard Applicability:This standard applies to high-purity tungsten and tungsten alloy sputtering targets for electronic thin films, hereinafter referred to as high-purity tungsten and tungsten alloy targets.
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