Standard Number: YS/T 935-2013(YS/T935-2013)
Chinese:电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南
English:Standard Guide for Analyzing and Reporting Purity Grade and Impurity Content of High Purity Metal Sputtering Targets for Electronic Thin Films
Effective Date:2014-03-01
Standard Applicability:
PDF Downloadable: N
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